Novel Superjunction LDMOS (>950 V) With a Thin Layer SOI

Abstract
A novel superjunction (SJ) LDMOS (>950 V) with a thin layer SOI (T-SJ LDMOS) combining the advantage of low specific on-resistance Ron,sp of the SJ and the high breakdown voltage VB of the thin SOI is proposed and experimentally demonstrated in this letter. Based on our previously developed equivalent substrate (ES) model, the optimized SJ endows the device with a respectably reduced Ron,sp without sacrificing VB. Meanwhile, the thin layer SOI is designed with the enhanced dielectric layer field (ENDIF) principle to carry out a high VB. The experimental results exhibit a Ron,sp of 145 mΩ·cm² with a VB of 977 V. This represents a reduction in Ron,sp by 18.1% when compared with the theoretical Ron,spα 2.5 “silicon limit”.
Funding Information
  • National Natural Science Foundation of China (61704020, 61376080, 61474017)
  • 13th Five-year Plan for Microelectronics Advanced Research Program (31513030201-2)
  • Fundamental Research Funds for the Central Universities (ZYGX2017KYQD159)

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