Demonstration of L-Shaped Tunnel Field-Effect Transistors
- 9 September 2015
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 63 (4), 1774-1778
- https://doi.org/10.1109/ted.2015.2472496
Abstract
An L-shaped tunnel FET (TFET), which features band-to-band tunneling (BTBT) perpendicular to the channel direction, is experimentally demonstrated for the first time. It is more scalable than other vertical-BTBT-based TFET designs and provides more than $1000\times $ higher ON-current ( $I_{{\mathrm{\scriptscriptstyle ON}}}$ ) than a conventional planar TFET with the same gate overdrive ( $V_{\mathrm{ov}}$ ) of 0.8 V, due to improved subthreshold swing ( $S$ ) and larger tunnel junction area. Its temperature dependence, constant $S$ , and nonlinear output characteristics are discussed.
Keywords
Funding Information
- Ministry of Trade, Industry and Energy (MOTIE) through KSRC within the Future Semiconductor Device Technology Development Program (10044842)
- Korea Evaluation Institute of Industrial Technology through the Ministry of Trade, Industry and Energy (MOTIE) within the Information Technology Research and Development Program (10039174)
- National Research Foundation of Korea through the Ministry of Science, ICT and Future Planning within the Mid-Career Researcher Program (NRF-2015003565)
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