Transparent conducting ZnO thin films prepared on low temperature substrates by chemical vapour deposition using Zn(C5H7O2)2
- 1 June 1994
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 246 (1-2), 65-70
- https://doi.org/10.1016/0040-6090(94)90733-1
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 22 references indexed in Scilit:
- Large-Area Milky Transparent Conducting Al-Doped ZnO Films Prepared by Magnetron SputteringJapanese Journal of Applied Physics, 1992
- Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor depositionJournal of Applied Physics, 1992
- Effect of Water Vapor on the Growth of Textured ZnO-Based Films for Solar Cells by DC-Magnetron SputteringJapanese Journal of Applied Physics, 1991
- Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1991
- Optical properties of transparent and heat reflecting ZnO:Al films made by reactive sputteringApplied Physics Letters, 1987
- Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1986
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1985
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysisThin Solid Films, 1983
- Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic fieldApplied Physics Letters, 1982