Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic field
- 15 November 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 41 (10), 958-960
- https://doi.org/10.1063/1.93355
Abstract
Highly conductive films of zinc oxide have been prepared by rf magnetron sputtering deposition on a substrate suspended perpendicular to the target under an applied external magnetic field in pure argon gas. It is shown that a film with low resistivity (5×10−4 Ω cm) and high optical transmission (>85% between 400 and 800 nm) can be produced on low-temperature substrates with a relatively high deposition rate. The sheet resistance and Hall mobility of the film are 10 Ω/⧠ and 120 cm2/Vs respectively. The high conductivity is achieved by an increase in Hall mobility due to improved crystallization.Keywords
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