A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
Open Access
- 20 August 2019
- journal article
- review article
- Published by MDPI AG in Micromachines
- Vol. 10 (8), 552
- https://doi.org/10.3390/mi10080552
Abstract
Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNxOy film. In particular, the preparation of SiNxOy film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.Keywords
Funding Information
- Beijing Municipal Science and Technology Commission (Z181100004418004)
- National Natural Science Foundation of China (61501039)
- Beijing Municipal Natural Science Foundation (2162017)
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