Silicon dioxide films by RF sputtering for microelectronic and MEMS applications
- 24 April 2007
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 17 (5), 1066-1077
- https://doi.org/10.1088/0960-1317/17/5/029
Abstract
No abstract availableKeywords
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