Stable deposition of silicon oxynitride thin films with intermediate refractive indices by reactive sputtering
- 1 March 2012
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 520 (10), 3862-3864
- https://doi.org/10.1016/j.tsf.2011.10.052
Abstract
No abstract availableKeywords
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