SiOxNy thin films deposited by reactive sputtering: Process study and structural characterisation
- 26 February 2007
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 515 (7-8), 3480-3487
- https://doi.org/10.1016/j.tsf.2006.10.125
Abstract
No abstract availableKeywords
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