Structural transition and recovery of Ge implanted β -Ga2O3

Abstract

Ion implantation-induced effects were studied in Ge implanted β-Ga₂O₃ with the fluence and energy of 3 × 10¹³ cm⁻²/60 keV, 5 × 10¹³ cm⁻²/100 keV, and 7 × 10¹³ cm⁻²/200 keV using analytical electron microscopy via scanning/transmission electron microscopy, electron energy loss spectroscopy, and precession electron diffraction via TopSpin. Imaging shows an isolated band of damage after Ge implantation, which extends ∼130 nm from the sample surface and corresponds to the projected range of the ions. Electron diffraction demonstrates that the entirety of the damage band is the κ phase, indicating an implantation-induced phase transition from β to κ-Ga₂O₃. Post-implantation annealing at 1150 °C for 60 s under the O₂ atmosphere led to a back transformation of κ to β; however, an ∼17 nm damage zone remained at the sample surface. Despite the back transformation from κ to β with annealing, O K-edge spectra show changes in the fine structure between the pristine, implanted, and implanted-annealed samples, and topspin strain analysis shows a change in strain between the two samples. These data indicate differences in the electronic/chemical structure, where the change of the oxygen environment extended beyond the implantation zone (∼130 nm) due to the diffusion of Ge into the bulk material, which, in turn, causes a tensile strain of 0.5%. This work provides a foundation for understanding of the effects of ion implantation on defect/phase evolution in β-Ga₂O₃ and the related recovery mechanism, opening a window toward building a reliable device for targeted applications.