Progress of Ultra-Wide Bandgap Ga < sub > 2 O < sub > 3 Semiconductor Materials in Power MOSFETs
Top Cited Papers
- 30 April 2020
- journal article
- research article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Power Electronics
- Vol. 35 (5), 5157-5179
- https://doi.org/10.1109/TPEL.2019.2946367
Abstract
As a promising ultra-wide bandgap semiconductor, the & x03B2;-phase of Ga2O3 has attracted more and more interest in the field of power electronics due to its ultra-wide bandgap (4.8 & x00A0;eV), high theoretical breakdown electric field (8 MV & x002F;cm), and large Baliga & x0027;s figure of merit, which is deemed as a potential candidate for next generation high-power electronics, including diodes, field effect transistors (FETs), etc. In this article, we introduce the basic material properties of Ga2O3, and review the recent progress and advances of & x03B2;-Ga2O3 based metal & x2013;oxide & x2013;semiconductor field-effect transistors (mosfets). Due to the problematic p-type doping technology up to now, the enhancement-mode (E-mode) & x03B2;-Ga2O3 FETs face more difficulties, compared with depletion mode (D-mode). This article focuses on reviewing the recent progress of E-mode Ga2O3 mosfets, summarizing and comparing various feasible solutions when p-type doping is absent. Furthermore, the device fabrication and performances of state-of-art & x03B2;-Ga2O3 mosfets, including D-mode, E-mode, and planar & x002F;vertical structure are fully discussed and compared, as well as potential solutions to the challenges of Ga2O3 FETs.Keywords
Funding Information
- National Natural Science Foundation of China (61874084, 51711530035, 61704125)
- Fundamental Research Funds for the Central Universities (XJS191102)
- Swedish Foundation for International Cooperation in Research and Higher Education
- Swedish Foundation for International Cooperation in Research and Higher Education (CH2016-6722)
This publication has 221 references indexed in Scilit:
- Valence band offset of β-Ga2O3/wurtzite GaN heterostructure measured by X-ray photoelectron spectroscopyNanoscale Research Letters, 2012
- Diamond Field-Effect Transistors with 1.3 A/mm Drain Current Density by Al2O3 Passivation LayerJapanese Journal of Applied Physics, 2012
- Wet Etching of β-Ga2O3 SubstratesJapanese Journal of Applied Physics, 2009
- Heteroepitaxy of Corundum-Structured α-Ga2O3 Thin Films on α-Al2O3 Substrates by Ultrasonic Mist Chemical Vapor DepositionJapanese Journal of Applied Physics, 2008
- Wet chemical etching behavior of β‐Ga2O3 single crystalphysica status solidi (c), 2008
- Diamond as an electronic materialMaterials Today, 2008
- Crystal growth of β-Ga2O3 by electric current heating methodCeramics International, 2004
- Wet Chemical and Plasma Etching of Ga2 O 3 ( Gd2 O 3 )Journal of the Electrochemical Society, 1997
- Optical absorption and photoconductivity at the band edge of β‐Ga2−xInxO3Physica Status Solidi (b), 1996
- Polymorphism of Ga2O3 and the System Ga2O3—H2OJournal of the American Chemical Society, 1952