Structural, optical and electronic properties of nanocrystalline TiN films
- 7 November 2005
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 16 (12), 3053-3056
- https://doi.org/10.1088/0957-4484/16/12/054
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Structural properties of nanoclusters: Energetic, thermodynamic, and kinetic effectsReviews of Modern Physics, 2005
- Nanostructured surfaces: challenges and frontiers in nanotechnologyJournal of Physics: Condensed Matter, 2004
- Variation of color in titanium and zirconium nitride decorative thin filmsThin Solid Films, 2002
- Nanostructured materialsReports on Progress in Physics, 2001
- Titanium nitride thin films obtained by a modified physical vapor deposition processThin Solid Films, 2000
- Combined electrical and mechanical properties of titanium nitride thin films as metallization materialsJournal of Applied Physics, 1999
- Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputteringJournal of Applied Physics, 1999
- The effect of thermal treatment on the structure, optical and electrical properties of amorphous titanium nitride thin filmsThin Solid Films, 1997
- Advanced multilayer metallization schemes with copper as interconnection metalThin Solid Films, 1993
- Chemical and structural analyses of the titanium nitride/alpha (6H)-silicon carbide interfaceJournal of Vacuum Science & Technology A, 1992