Titanium nitride thin films obtained by a modified physical vapor deposition process
- 1 November 2000
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 376 (1-2), 9-15
- https://doi.org/10.1016/s0040-6090(00)01192-5
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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