Effect of ionic strength on ruthenium CMP in H2O2-based slurries
- 1 October 2014
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 317, 332-337
- https://doi.org/10.1016/j.apsusc.2014.08.063
Abstract
No abstract availableKeywords
Funding Information
- BASF
- NSFC (51321092, 51275263)
- The State Key Development Program for Basic Research of China (2014CB046404)
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