Environmentally clean slurry using nano-TiO2-abrasive mixed with oxidizer H2O2 for ruthenium-film chemical mechanical planarization
- 20 June 2013
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 282, 844-850
- https://doi.org/10.1016/j.apsusc.2013.06.068
Abstract
No abstract availableKeywords
Funding Information
- Hanyang University and Samsung Electronics Co. Ltd.
- Korean Ministry of Knowledge and Economy
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