The stability of aluminium-doped ZnO transparent electrodes fabricated by sputtering
- 1 January 1986
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 135 (2), 183-187
- https://doi.org/10.1016/0040-6090(86)90125-2
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applicationsJournal of Applied Physics, 1984
- The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputteringThin Solid Films, 1984
- Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic fieldApplied Physics Letters, 1982
- Fabrication and characterization of indium tin oxide thin films for electroluminescent applicationsThin Solid Films, 1981
- Effects of heat treatment on the optical and electrical properties of indium–tin oxide filmsJournal of Applied Physics, 1978
- An investigation of the electrical properties of zinc oxide thin films influenced by oxygen adsorptionJournal of Vacuum Science and Technology, 1975