Effect of microfabrication processes on surface roughness parameters of silicon surfaces
- 31 December 2004
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 188-189, 581-587
- https://doi.org/10.1016/j.surfcoat.2004.07.015
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Mechanical property measurements of nanoscale structures using an atomic force microscopeUltramicroscopy, 2002
- Static friction and surface roughness studies of surface micromachined electrostatic micromotors using an atomic force/friction force microscopeJournal of Vacuum Science & Technology A, 2001
- Differences in anisotropic etching properties of KOH and TMAH solutionsSensors and Actuators A: Physical, 2000
- Measurement of mechanical properties for MEMS materialsMeasurement Science and Technology, 1999
- Roughening of single-crystal silicon surface etched by KOH water solutionSensors and Actuators A: Physical, 1999
- Silicon anisotropic etching in alkaline solutions II on the influence of anisotropy on the smoothness of etched surfacesSensors and Actuators A: Physical, 1998
- AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si in KOH for micromachining applicationsJournal of Micromechanics and Microengineering, 1997
- Why Si(100) steps are rougher after etchingPhysical Review B, 1997
- Critical Review: Adhesion in surface micromechanical structuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Micromechanical fracture strength of siliconJournal of Applied Physics, 1990