Roughening of single-crystal silicon surface etched by KOH water solution
- 9 March 1999
- journal article
- Published by Elsevier BV in Sensors and Actuators A: Physical
- Vol. 73 (1-2), 122-130
- https://doi.org/10.1016/s0924-4247(98)00270-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Anistropic multi-step etch processes of siliconJournal of Micromechanics and Microengineering, 1997
- On the Mechanism of Anisotropic Etching of SiliconJournal of the Electrochemical Society, 1993