Energy-Band Engineering for Improved Charge Retention in Fully Self-Aligned Double Floating-Gate Single-Electron Memories
- 17 October 2011
- journal article
- research article
- Published by American Chemical Society (ACS) in Nano Letters
- Vol. 11 (11), 4520-4526
- https://doi.org/10.1021/nl202434k
Abstract
International audienceWe present a new fully self-aligned single-electron memory with a single pair of nano floating gates, made of different materials (Si and Ge). The energy barrier that prevents stored charge leakage is induced not only by quantum effects but also by the conduction-band offset that arises between Ge and Si. The dimension and position of each floating gate are well defined and controlled. The devices exhibit a long retention time and single-electron injection at room temperatureThis publication has 28 references indexed in Scilit:
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