Strain relaxation in strained-Si layers on SiGe-on-insulator substrates
- 28 November 2006
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 22 (1), S21-S25
- https://doi.org/10.1088/0268-1242/22/1/s05
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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