A high current density SOI-LIGBT with Segmented Trenches in the Anode region for suppressing negative differential resistance regime
- 1 May 2015
- conference paper
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
A SOI-LIGBT with Segmented Trenches in the Anode region (STA-LIGBT) is proposed and compared with the separated shorted-anode LIGBT (SSA-LIGBT) for the first time. The proposed STA-LIGBT structure features that there are segmented trenches located between the P+ anode and the segmented N+ anodes. By employing the segmented trenches, the resistance between the P+ anode and the shorted N+ anode is significantly increased, which effectively suppresses the negative differential resistance (NDR). The experiments show that the STA-LIGBT with its blocking voltage of 540V can achieve a current density (JC) of 247 A/cm2 when the gate voltage is 10V and the anode voltage is 3V. With the same the NDR regime (the snapback voltage is 1.3V), the current density (JC) of the STA-LIGBT is about 170% of that of the SSA-LIGBT. The fabrication of the segmented trenches is compatible with the trench isolation process and no extra or complicated processes are needed.Keywords
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