p -type Zn1−xMgxO films with Sb doping by radio-frequency magnetron sputtering

Abstract
Sb-doped Zn 1 − x Mg x O films were grown on c -plane sapphire substrates by radio-frequency magnetron sputtering. The p -type conduction of the films ( 0.05 ⩽ x ⩽ 0.13 ) was confirmed by Hall measurements, revealing a hole concentration of 10 15 – 10 16 cm − 3 and a mobility of 0.6 – 4.5 cm 2 ∕ V s . A p - n homojunction comprising an undoped ZnO layer and an Sb-doped Zn 0.95 Mg 0.05 O layer shows a typical rectifying characteristic. Sb-doped p -type Zn 1 − x Mg x O films also exhibit a changeable wider band gap as a function of x , implying that they can probably be used for fabrication of ZnO-based quantum wells and ultraviolet optoelectronic devices.