Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
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- 28 February 2003
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 249 (1-2), 251-261
- https://doi.org/10.1016/s0022-0248(02)02133-4
Abstract
No abstract availableKeywords
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