Surface roughness reduction in atomic layer epitaxy growth of titanium dioxide thin films
- 1 September 1994
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 249 (2), 155-162
- https://doi.org/10.1016/0040-6090(94)90754-4
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Atomic layer epitaxy growth of titanium dioxide thin films from titanium ethoxideChemistry of Materials, 1994
- Optical determination of the film thicknesses in multilayer thin film structuresThin Solid Films, 1993
- Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin filmsChemistry of Materials, 1993
- Quantized Semiconductor Particles: A novel state of matter for materials scienceAdvanced Materials, 1993
- Microfabrication of cantilever styli for the atomic force microscopeJournal of Vacuum Science & Technology A, 1990
- Atomic layer epitaxyMaterials Science Reports, 1989
- Africa and the Nobel PrizeWorld Literature Today, 1988
- The structure of natively textured SnO2film and its application to an optical confinement-type a-Si:H solar cellIEEE Transactions on Electron Devices, 1987
- Relationship of the total integrated scattering from multilayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation propertiesApplied Optics, 1983
- The effects of sample imperfections on optical spectraPhysica Status Solidi (b), 1972