Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
- 1 February 1999
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 340 (1-2), 110-116
- https://doi.org/10.1016/s0040-6090(98)01356-x
Abstract
No abstract availableKeywords
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