Metalorganic chemical vapor deposition of oriented ZnO films over large areas
- 15 December 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 43 (12), 1108-1110
- https://doi.org/10.1063/1.94243
Abstract
A metalorganic chemical vapor deposition process for preparing c-axis-oriented ZnO films in a simple system of the type commercially available for SiO2 deposition is described. The resulting layers are highly uniform in thickness and adhere to a variety of substrates. Film properties and structure are described briefly.Keywords
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