Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering
- 1 February 1995
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 257 (1), 32-35
- https://doi.org/10.1016/0040-6090(94)06331-1
Abstract
No abstract availableKeywords
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