Deposition of conducting and transparent thin films of indium tin oxide by reactive ion plating
- 19 June 1981
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 80 (1-3), 149-155
- https://doi.org/10.1016/0040-6090(81)90217-0
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- A method for the uniform chemical vapor deposition of tin-doped indium sesquioxide films on cylindrical substratesJournal of the Less Common Metals, 1979
- In2O3:(Sn) and SnO2:(F) films — Application to solar energy conversion; part 1 — Preparation and characterizationMaterials Research Bulletin, 1979
- Properties of transparent conducting films of SnO2:Sb and In2O3: Sn deposited by hydrolysisThin Solid Films, 1978
- Large-scale sputtering of indium–tin oxideJournal of Vacuum Science and Technology, 1978
- Preparation and properties of reactively co-sputtered transparent conducting filmsThin Solid Films, 1975
- Characterization of transparent conductive thin films of indium oxideJournal of Vacuum Science and Technology, 1975