Implanted hydrogen isotope retention and chemical behavior in boron thin films for wall conditioning
- 1 August 2004
- journal article
- Published by Elsevier BV in Journal of Nuclear Materials
- Vol. 329-333, 870-873
- https://doi.org/10.1016/j.jnucmat.2004.04.279
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Studies on structural and chemical characterization for boron coating films deposited by PCVDJournal of Nuclear Materials, 2004
- Characterization of hydrogenated amorphous boron by a combination of infrared absorption spectroscopy and thermal analysesJournal of Alloys and Compounds, 2003
- Chemical Behaviors of Energetic Deuterium Implanted into Boron CoatingsFusion Science and Technology, 2003
- Boronization effects using deuterated-decaborane (B10D14) in JT-60UJournal of Nuclear Materials, 2003
- Hydrogen in mechanically milled amorphous boronJournal of Alloys and Compounds, 2003
- Effects of Boronization in LHDJournal of Plasma and Fusion Research, 2003
- XPS study of the process of oxygen gettering by thin films of PACVD boronJournal of Nuclear Materials, 2000
- Dynamic behavior of hydrogen atoms with a boronized wallJournal of Nuclear Materials, 1998
- Effects of boronization of the first wall in TFTRJournal of Nuclear Materials, 1990
- Thermal desorption of gasesVacuum, 1962