The impact of residual stress on resonating piezoelectric devices
Open Access
- 1 November 2020
- journal article
- research article
- Published by Elsevier BV in Materials & Design
- Vol. 196, 109126
- https://doi.org/10.1016/j.matdes.2020.109126
Abstract
No abstract availableFunding Information
- Electronic Components and Systems for European Leadership (Ecsel-783132- Position-II-2017-IA)
- Aalto-Yliopisto (Ecsel-783132- Position-II-2017-IA)
This publication has 23 references indexed in Scilit:
- Equivalence of Kröner and weighted Voigt-Reuss models for x-ray stress determinationJournal of Applied Physics, 2013
- Three-dimensional micro electromechanical system piezoelectric ultrasound transducerApplied Physics Letters, 2012
- Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperatureJournal of Crystal Growth, 2012
- X-ray diffraction of III-nitridesReports on Progress in Physics, 2009
- Anisotropic elasticity in hexagonal crystalsThin Solid Films, 2007
- Stress analysis of polycrystalline thin films and surface regions by X-ray diffractionJournal of Applied Crystallography, 2005
- Rietveld-refinement study of aluminium and gallium nitridesJournal of Alloys and Compounds, 2004
- Relationship between residual stress and structural properties of AlN films deposited by r.f. reactive sputteringThin Solid Films, 2003
- Error Corrections For X-RAY Powder DiffractometryCanadian Metallurgical Quarterly, 2001
- The influence of multiaxial stress states, stress gradients and elastic anisotropy on the evaluation of (Residual) stresses by X-raysJournal of Applied Crystallography, 1979