Relationship between residual stress and structural properties of AlN films deposited by r.f. reactive sputtering
- 1 July 2003
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 435 (1-2), 193-198
- https://doi.org/10.1016/s0040-6090(03)00353-5
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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