Chemical kinetics for film growth in silicon HWCVD
- 1 April 2002
- journal article
- Published by Elsevier BV in Journal of Non-Crystalline Solids
- Vol. 299-302, 25-29
- https://doi.org/10.1016/s0022-3093(01)00993-0
Abstract
No abstract availableFunding Information
- Ministry of Education, Culture, Sports, Science and Technology (11450297)
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