Transport mechanism of deposition precursors in catalytic chemical vapor deposition studied using a reactor tube
- 1 May 2000
- journal article
- Published by Elsevier BV in Journal of Non-Crystalline Solids
- Vol. 266-269, 100-104
- https://doi.org/10.1016/s0022-3093(99)00747-4
Abstract
No abstract availableKeywords
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- Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2Applied Physics Letters, 1985