An improved etching process used for the fabrication of submicron Nb/AlO/sub x//Nb Josephson junctions
- 1 June 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Applied Superconductivity
- Vol. 5 (2), 2334-2337
- https://doi.org/10.1109/77.403053
Abstract
No abstract availableKeywords
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