Optical and electronic properties of transparent conducting ZnO and ZnO:Al films prepared by evaporating method
- 1 December 1999
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 357 (2), 98-101
- https://doi.org/10.1016/s0040-6090(99)00357-0
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Crystallite orientation and the related photoresponse of hexagonal ZnO films deposited by r.f. sputteringThin Solid Films, 1994
- Preparation of ZnO films by reactive evaporationThin Solid Films, 1994
- Aluminum-doped zinc oxide transparent conductors deposited by the sol-gel processThin Solid Films, 1994
- Optical properties of spray deposited ZnO filmsSolid State Communications, 1991
- Études sur la croissance, la structure et la composition de couches minces de ZnO et ZnO dopé a l'indium, obtenues par procédé pyrosolThin Solid Films, 1991
- Preparation of ZnO films films by activated reactive evaporationSemiconductor Science and Technology, 1990
- Growth and characterization of heteroepitaxial ZnO thin films by organometallic chemical vapor depositionJournal of Crystal Growth, 1988
- Optical and electronic properties of zinc oxide films prepared by spray pyrolysisThin Solid Films, 1985
- The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputteringThin Solid Films, 1984
- The Influence of Ambient Oxygen on the Electronic Conductivity of ZnO Thin FilmsJapanese Journal of Applied Physics, 1970