Two-dimensional nanolithography using atom interferometry

Abstract

We propose a scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a $\pi ∕2\text{−}\pi \text{−}\pi ∕2$ atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over the atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional ${}^{87}\mathrm{Rb}$ wave packets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.