Polarization gradient light masks in atom lithography
- 15 April 1999
- journal article
- Published by IOP Publishing in Europhysics Letters
- Vol. 46 (2), 148-153
- https://doi.org/10.1209/epl/i1999-00237-5
Abstract
In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic eld.Keywords
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