Correlation between plasma dynamics and thin film properties in pulsed laser deposition
- 1 February 1997
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 109-110, 595-600
- https://doi.org/10.1016/s0169-4332(96)00640-x
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Interaction of laser ablation plasma plume with grid screensApplied Physics Letters, 1995
- Pulsed laser deposition of BaTiO3 thin films and their optical propertiesApplied Physics Letters, 1995
- Dynamics of laser ablation plume penetration through low pressure background gasesApplied Physics Letters, 1995
- Indium tin oxide on InP by pulsed laser depositionThin Solid Films, 1995
- Pulsed laser deposition of VO2 thin filmsApplied Physics Letters, 1994
- Crystalline phases of II-VI compound semiconductors grown by pulsed laser depositionApplied Physics Letters, 1994
- Temporal and spatial evolution of laser ablated plasma from YBa2Cu3O7Applied Physics Letters, 1994
- Correlation between target-substrate distance and oxygen pressure in pulsed laser deposition of YBa2Cu3O7Applied Physics Letters, 1992
- Physics of in-Situ Oxide Superconducting Thin Films DepositionPublished by Springer Science and Business Media LLC ,1990
- Generation of high-energy atomic beams in laser-superconducting target interactionsApplied Physics Letters, 1989