Purification of metallurgical-grade silicon powder via chemical attack by hydrofluoric and nitric acids followed by thermal treatment
- 1 December 2013
- journal article
- Published by Elsevier BV in Materials Science in Semiconductor Processing
- Vol. 16 (6), 1742-1746
- https://doi.org/10.1016/j.mssp.2013.06.006
Abstract
No abstract availableKeywords
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