Micro XY-stage using silicon on a glass substrate

Abstract

In this paper we describe a single-crystal silicon (SCS) micro XY-stage with a 50 × 50 μm² scanning range. A simple fabrication process using a silicon-on-glass substrate is proposed for a silicon high aspect ratio structure (HARS) and easy release. The high aspect ratio SCS actuator is achieved by deep reactive ion etching and is released simply by glass etching in a hydrofluoric acid solution. The sticking problem is removed by a 100 μm deep etching of the glass substrate during the release process. The static travel range of the fabricated actuator is measured using a built-in scale and a map of the mechanical cross talk between the X- and Y-axis driving is constructed. The resonant frequency is measured at 360 Hz in air.