In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of TiN and Ti(Al)N Thin Films
- 28 December 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (1), 281-287
- https://doi.org/10.1021/cm011150r
Abstract
No abstract availableKeywords
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