Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films
- 30 August 2001
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 7 (5), 211-217
- https://doi.org/10.1002/1521-3862(200109)7:5<211::aid-cvde211>3.0.co;2-l