RF Sputtered Low-Resistivity and High-Transmittance Indium Gallium Zinc Oxide Films for Near-UV Applications

Abstract
Indium gallium zinc oxide (IGZO) films were deposited on glass substrates by co-sputtering and targets. The structural, electrical, and optical properties of the IGZO films are investigated as functions of substrate temperature and radio frequency (rf) power supplied to the target . The X-ray diffraction patterns show that the deposited IGZO films are amorphous in nature. The IGZO films have the lowest resistivity of with an In content of 24.56 atom % at substrate temperature. The optical transmittance at exceeds 80% for all samples.

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