Optical, wave measurements, and modeling of helicon plasmas for a wide range of magnetic fields
- 19 February 2004
- journal article
- research article
- Published by AIP Publishing in Physics of Plasmas
- Vol. 11 (3), 878-887
- https://doi.org/10.1063/1.1642656
Abstract
Helicon waves are excited in a plasma wave facility by a half-turn double-helix antenna operating at 13.56 MHz for static magnetic fields ranging from 200 to 1000 G. A non-perturbing optical probe located outside the Pyrex™ plasma chamber is used to observe 443 nm Ar II emission that is spatially and temporally correlated with the helicon wave. The Ar II emission is measured along with wave magnetic and Langmuir probe density measurements at various axial and radial positions. 105 GHz interferometry is used to verify the bulk temperature corrected Langmuir probemeasurements. The measured peak Ar II emission phase velocity is compared to the measuredwavemagnetic field phase velocity and code predicted wave phase velocity for the transition and blue mode regimes. Very different properties of the optical emission peak phase and wavecharacteristics for the transition and helicon modes of operation are observed. Comparison of the experimental results with the ANTENAII code [Y. Mouzouris and J. E. Scharer, IEEE Trans. Plasma Sci. 24, 152 (1996)] is carried out for the wave field measurements for the two regimes of operation.Keywords
This publication has 27 references indexed in Scilit:
- Comparing experiments with modeling for light ion helicon plasma sourcesPhysics of Plasmas, 2002
- Investigation of microwave plasmas produced in a mirror machine using ordinary-mode polarizationPlasma Sources Science and Technology, 1999
- Collisionless energy coupling to high-velocity electrons in the near field of an antenna: neutral gas ionization by helicon wavesPlasma Physics and Controlled Fusion, 1998
- Multiple Electron Beams Generated by a Helicon Plasma DischargePhysical Review Letters, 1998
- Characterization of an azimuthally symmetric helicon wave high density plasma sourceJournal of Vacuum Science & Technology A, 1997
- The effects of the density profile on the power absorption and the equilibrium density in helicon plasmasPhysics of Plasmas, 1997
- Experiments and modeling of a helicon sourceJournal of Vacuum Science & Technology A, 1996
- Modeling of profile effects for inductive helicon plasma sourcesIEEE Transactions on Plasma Science, 1996
- The application of the helicon source to plasma processingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Ar ii laser generated by Landau damping of whistler waves at the lower hybrid frequencyPhysical Review Letters, 1989