High temperature coefficients of resistance of VO2 films grown by excimer-laser-assisted metal organic deposition process for bolometer application
- 15 September 2010
- journal article
- research article
- Published by Elsevier BV in Materials Letters
- Vol. 64 (17), 1921-1924
- https://doi.org/10.1016/j.matlet.2010.05.050
Abstract
No abstract availableKeywords
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