Low temperature fabrication of VOx thin films for uncooled IR detectors by direct current reactive magnetron sputtering method
- 15 December 2007
- journal article
- Published by Elsevier BV in Infrared Physics & Technology
- Vol. 51 (4), 287-291
- https://doi.org/10.1016/j.infrared.2007.12.002
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Quantum size effect in antimony thin films and its applicationInfrared Physics & Technology, 2005
- Room temperature deposited vanadium oxide thin films for uncooled infrared detectorsMaterials Research Bulletin, 2003
- Phase transformation and semiconductor-metal transition in thin films of VO2 deposited by low-pressure metalorganic chemical vapor depositionJournal of Applied Physics, 2002
- Heat-sensitive materials for uncooled microbolometer arraysJournal of Optical Technology, 2001
- Linear uncooled microbolometer array based on VOx thin filmsInfrared Physics & Technology, 2001
- Monolithic two-dimensional arrays of micromachined microstructures for infrared applicationsProceedings of the IEEE, 1998
- A semiconductor YBaCuO microbolometer for room temperature IR imagingIEEE Transactions on Electron Devices, 1997
- The effects of biasing and annealing on the optical properties of radio-frequency sputtered VO2Journal of Vacuum Science & Technology A, 1990
- Deposition of vanadium oxide films by direct-current magnetron reactive sputteringJournal of Vacuum Science & Technology A, 1988
- Modifications in the phase transition properties of predeposited VO2 filmsJournal of Vacuum Science & Technology A, 1984