X-ray double and triple crystal diffractometry of mosaic structure in heteroepitaxial layers

Abstract

X-ray diffraction in thin layers containing small randomly placed defects is described by means of the kinematical diffraction theory and optical coherence formalism. The method enables us to calculate both the diffracted intensity and its angular distribution, so that it can be used for simulating double crystal and triple crystal x-ray diffractometry experiments. The theory has been applied to experimental data obtained from diffractometry measurements of an epitaxial ZnTe layer with mosaic structure after several steps of chemical thinning. A good agreement of the theory with experiments has been achieved.