Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process
- 29 January 2011
- journal article
- research article
- Published by Springer Science and Business Media LLC in Plasma Chemistry and Plasma Processing
- Vol. 31 (2), 353-372
- https://doi.org/10.1007/s11090-011-9286-3
Abstract
No abstract availableKeywords
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