Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison
- 1 January 2001
- journal article
- Published by Springer Science and Business Media LLC in Plasmas and Polymers
- Vol. 6 (4), 237-266
- https://doi.org/10.1023/a:1014414016164