Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer
Top Cited Papers
- 15 June 2007
- journal article
- review article
- Published by American Chemical Society (ACS) in Nano Letters
- Vol. 7 (7), 2046-2050
- https://doi.org/10.1021/nl070924l
Abstract
Templated self-assembly of a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS−PDMS) diblock copolymer has been investigated for nanolithography applications. The large χ-parameter of the blocks and the use of a PDMS−brush substrate surface treatment are especially advantageous for achieving long-range ordering and minimizing defect densities, and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. By adjusting mesa width and solvent-annealing vapor pressure and time, the cylinders can be intentionally oriented parallel or perpendicular to the trench walls. Pattern transfer into thin silica is also demonstrated. This block copolymer system has excellent characteristics for self-assembled nanolithography applications.Keywords
This publication has 29 references indexed in Scilit:
- Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐UpAdvanced Materials, 2006
- Phase Behavior of Near-Monodisperse Semifluorinated Diblock Copolymers by Atom Transfer Radical PolymerizationMacromolecules, 2006
- Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” ProcessesMRS Bulletin, 2005
- Self-aligned self assembly of multi-nanowire silicon field effect transistorsApplied Physics Letters, 2005
- Ordering mechanisms in two-dimensional sphere-forming block copolymersPhysical Review E, 2005
- Solvent‐Induced Ordering in Thin Film Diblock Copolymer/Homopolymer MixturesAdvanced Materials, 2004
- Micro-vs.macro-phase separation in binary blends of poly(styrene)-poly(isoprene) and poly(isoprene)-poly(ethylene oxide) diblock copolymersEurophysics Letters, 2001
- Synthesis, Characterization, and Interaction Strengths of Difluorocarbene-Modified Polystyrene−Polyisoprene Block CopolymersMacromolecules, 2000
- Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymersPolymer, 1995
- Block Copolymer Thermodynamics: Theory and ExperimentAnnual Review of Physical Chemistry, 1990