Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabrication
- 17 August 2010
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
Abstract
No abstract availableKeywords
This publication has 32 references indexed in Scilit:
- Multi-silicon ridge nanofabrication by repeated edge lithographyNanotechnology, 2009
- Sub-10nm silicon ridge nanofabrication by advanced edge lithography for NIL applicationsMicroelectronic Engineering, 2009
- Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithographyJournal of Micromechanics and Microengineering, 2008
- Single Sub-20 nm Wide, Centimeter-Long Nanofluidic Channel Fabricated by Novel Nanoimprint Mold Fabrication and Direct ImprintingNano Letters, 2007
- Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a maskJournal of Micromechanics and Microengineering, 2006
- Fabrication of Metallic Nanodots in Large-Area Arrays by Mold-to-Mold Cross Imprinting (MTMCI)Nano Letters, 2005
- New Approaches to Nanofabrication: Molding, Printing, and Other TechniquesChemical Reviews, 2005
- Wet anisotropic etching for fluidic 1D nanochannelsJournal of Micromechanics and Microengineering, 2003
- Fabrication of Sub-10-nm Silicon Nanowire Arrays by Size Reduction LithographyThe Journal of Physical Chemistry B, 2003
- Etching methodologies in -oriented silicon wafersJournal of Microelectromechanical Systems, 2000